Parameters optimization for focused ion beam fabrication of phase electron holograms

F. Venturi; G.C. Gazzadi

doi:10.4081/microscopie.2016.5748

Parameters optimization for focused ion beam fabrication of phase electron holograms

https://doi.org/10.4081/microscopie.2016.5748

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Authors

F. Venturi
federico.venturi@unimore.it
University of Modena and Reggio Emilia, CNR-Istituto Nanoscienze, Italy. http://orcid.org/0000-0002-3156-4736
G.C. Gazzadi CNR-Istituto Nanoscienze, Italy.

Phase plate electron holograms allow the information of a wavefunction to be encoded onto a physical substrate (i.e. a Si₃N₄ membrane) and recovered in a transmission electron microscope in diffraction mode. One widespread means of fabrication of phase holograms is focused ion beam, however, fabrication parameters have to be carefully chosen in order to obtain the aimed results. In this work, we present the focused ion beam fabrication of phase holograms encoding an Ince-Gaussian beam, and investigate their characteristics with varying fabrication parameters.

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F. Venturi, University of Modena and Reggio Emilia, CNR-Istituto Nanoscienze

PhD Student

University of Modena and Reggio Emilia

Supporting Agencies

Stefano Frabboni, University of Modena and Reggio Emilia, Vincenzo Grillo, CNR-NANO S3, Roberto Balboni, CNR-IMM

Venturi, F., & Gazzadi, G. (2016). Parameters optimization for focused ion beam fabrication of phase electron holograms. Microscopie, 25(1), 57–63. https://doi.org/10.4081/microscopie.2016.5748

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Parameters optimization for focused ion beam fabrication of phase electron holograms

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