Parameters optimization for focused ion beam fabrication of phase electron holograms
https://doi.org/10.4081/microscopie.2016.5748
Accepted: 26 February 2016
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Phase plate electron holograms allow the information of a wavefunction to be encoded onto a physical substrate (i.e. a Si3N4 membrane) and recovered in a transmission electron microscope in diffraction mode. One widespread means of fabrication of phase holograms is focused ion beam, however, fabrication parameters have to be carefully chosen in order to obtain the aimed results. In this work, we present the focused ion beam fabrication of phase holograms encoding an Ince-Gaussian beam, and investigate their characteristics with varying fabrication parameters.
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Supporting Agencies
Stefano Frabboni, University of Modena and Reggio Emilia, Vincenzo Grillo, CNR-NANO S3, Roberto Balboni, CNR-IMMPAGEPress has chosen to apply the Creative Commons Attribution NonCommercial 4.0 International License (CC BY-NC 4.0) to all manuscripts to be published.
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